[ecoop-info] Call for Papers - First Workshop on Patterns Promotion and Anti-patterns Prevention (PPAP)

[Laleh Mousavi Eshkevari]

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CALL FOR PAPERS
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First Workshop on Patterns Promotion and Anti-patterns 
Prevention (PPAP)

Collocated with the 17th European Conference on Software
Maintenance and Reengineering (CSMR 2013),
March 5-8, 2013, Genova, Italy

Workshop date: March 5, 2013

Highlights:
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- PPAP Website: http://ppap.soccerlab.polymtl.ca/
- Abstract submission: by 14th January 2013
- Paper submission: by 20th January 2013
- Contact & submission: ppap at polymtl.ca
- IEEE Proceeding Template: 
http://www.ieee.org/conferences_events/conferences/publishing/templates.html

Workshop:
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Patterns are good solutions to problems reoccurring in certain 
contexts while anti-patterns are the contrary, i.e., common poor 
practices. Now, it has been almost two decades since design 
patterns [Gamma et al., 1994] and anti-patterns [Koenig, 1995] 
were introduced in the domain of software engineering. 
Since then, there has been a tremendous number of works mainly 
on the definition, detection, application, and impact of design 
patterns and anti-patterns. These works built a well-established 
topic of research and a foundation for new families of patterns 
and anti-patterns. With the aim of promoting the application of 
patterns and prevent the spread of anti-patterns, the first 
objective of PPAP workshop is to build a bridge between the 
different families of patterns and anti-patterns in software 
engineering. For this purpose, we plan to open discussions on 
possible interactions between patterns and anti-patterns across 
different domains in software engineering and how they can 
benefit from one another. In particular, researchers can share 
their experiences as well as compare their results. Also, we 
believe that emerging patterns and anti-patterns can benefit 
from the past lessons and successes of their predecessors.

Topics:
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Researchers and practitioners are invited to submit research 
papers, experience reports, and discussion papers of work-in-
progress on patterns promotion and anti-patterns prevention. 
Topics include but are not limited to:
- definition and detection;
- impact on software quality, testing;
- application and refactoring;
- empirical studies;
- evolution;
of patterns and anti-patterns in software engineering.

Paper Format:
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All papers should be submitted in PDF file of IEEE two-column 
proceedings format and should not exceed 5 pages (including all 
text, figures, references and appendices) by 20 January 2013 
(included) to ppap at polymtl.ca. The notice of accepted papers will
be sent on February 1st, 2013. Accepted papers will be published 
on the workshop website. Extended versions of accepted papers 
could be published in a post-workshop special issue of ECEASST.

Important Dates:
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- Abstract deadline: 14th January 2013
- Submission deadline: 20th January 2013
- Notification date: 1st February 2013
- Camera ready: 10th February 2013
- Electronic version available: 26th February 2013

Steering Committee:
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- Giuliano Antoniol, École Polytechnique de Montréal, Canada
- Yann-Gaël Guéhéneuc, École Polytechnique de Montréal, Canada
- Leon Moonen, Simula Research Laboratory, Norway

Organizing Committee:
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- Venera Arnaoudova, École Polytechnique de Montréal, Canada
- Laleh Eshkevari, École Polytechnique de Montréal, Canada
- Aminata Sabané, École Polytechnique de Montréal, Canada
- Wei Wu, École Polytechnique de Montréal, Canada
				
Program Committee:
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- Giuliano Antoniol, École Polytechnique de Montréal, Canada
- Yann-Gael Guéhéneuc, École Polytechnique de Montréal, Canada
- Foutse Khomh, École Polytechnique de Montréal, Canada
- Naouel Moha, Université du Québec à Montréal, Canada
- Leon Moonen, Simula Research Laboratory, Norway
- Daniele Romano, Delft University of Technology, The Netherlands
- Lionel Seinturier, University of Lille & Institut Universitaire de France, France
- Nikolaos Tsantalis, Concordia University, Canada
- Aiko Yamashita, Simula Research Laboratory, Norway
- Andy Zaidman, Delft University of Technology, The Netherlands